Subscribe options

Select your newsletters:


Please enter your email address:

@

News & Media

Latest ITER Newsline

  • Worksite | First pillars for the crane hall

    For the overhead cranes to deliver machine components into the Tokamak assembly pit, the rails that carry them need to be extended some 80 metres beyond the tem [...]

    Read more

  • Transport | 300 tonnes of equipment on its way to ITER

    A specially designed assembly tool and elements of the cryostat and vacuum vessel thermal shields are part of the shipments travelling now from Korea to ITER. W [...]

    Read more

  • Fusion world | A new tokamak in town

    After EAST in China and WEST in France, another of the cardinal points of the compass has been chosen to name a tokamak. Introducing NORTH—the NORdic Tokamak de [...]

    Read more

  • Opportunities | Bringing the ITER Business Forum to Washington

    Every second year, a two-day ITER Business Forum is held to invite existing and potential suppliers for the ITER Project—laboratories, universities, and compani [...]

    Read more

  • World Energy Congress | Fusion "at a time of transition"

    In the United Arab Emirates, Abu Dhabi is often referred to as a tourism hotspot that combines luxury and ancient traditions. In September, Abu Dhabi was in the [...]

    Read more

Of Interest

See archived entries

UV light from plasma to etch next-generation chips

Xenon plasma produced in this laboratory equipment generates the Extreme Ultraviolet (EUV) wavelentgh that should provide the light output that the microprocessor industry needs. © University of Washington (Click to view larger version...)
Xenon plasma produced in this laboratory equipment generates the Extreme Ultraviolet (EUV) wavelentgh that should provide the light output that the microprocessor industry needs. © University of Washington
Light is the etching tool industry uses to create the microscopic circuits on the surface of silicon microprocessors. As "chips" follow Moore's law and become more powerful with each new generation, the features on the silicon become denser, meaning smaller structures need to be etched.

The short-wave (193 nanometres) ultraviolet light that is currently used by the industry is neither "sharp" nor powerful enough to meet the next generations' standards. What industry needs is light with an even shorter wavelength—less than one-tenth the present one—that will enable the etching of even finer grooves.

Such extreme ultraviolet light can be created only from plasmas. Scientists at the University of Washington College of Engineering have developed a "low-cost version of a fusion reactor," dubbed ZaP, that should provide the light output that the microprocessor industry needs.
 
Read the full story here


return to the latest published articles