Subscribe options

Select your newsletters:


Please enter your email address:

@

News & Media

Latest ITER Newsline

  • The magnet lab next door

    Two and a half years ago ITER and the French Alternative Energies and Atomic Energy Commission (CEA) entered a collaborationto prepare for the challenging task [...]

    Read more

  • Activity on every floor

    At every floor of the Tokamak Complex—from the lowest underground level (B2) all the way to the second regular level of the bioshield (L2)—there is intense acti [...]

    Read more

  • Bringing the Research Plan up to date

    The ITER Research Plan is an ITER baseline document which outlines the main lines of science and technology research derived from the project's mission goals. [...]

    Read more

  • Further validation for ring magnet fabrication

    Once a component mockup has been produced—and before fabrication can begin on the actual component or system—a manufacturing readiness review is required to ens [...]

    Read more

  • First central solenoid module ready for heat treatment

    In a major milestone, the US contractor responsible for the fabrication of the ITER central solenoid has successfully joined seven individual coil sections, or [...]

    Read more

Of Interest

See archived articles

UV light from plasma to etch next-generation chips

Xenon plasma produced in this laboratory equipment generates the Extreme Ultraviolet (EUV) wavelentgh that should provide the light output that the microprocessor industry needs. © University of Washington (Click to view larger version...)
Xenon plasma produced in this laboratory equipment generates the Extreme Ultraviolet (EUV) wavelentgh that should provide the light output that the microprocessor industry needs. © University of Washington
Light is the etching tool industry uses to create the microscopic circuits on the surface of silicon microprocessors. As "chips" follow Moore's law and become more powerful with each new generation, the features on the silicon become denser, meaning smaller structures need to be etched.

The short-wave (193 nanometres) ultraviolet light that is currently used by the industry is neither "sharp" nor powerful enough to meet the next generations' standards. What industry needs is light with an even shorter wavelength—less than one-tenth the present one—that will enable the etching of even finer grooves.

Such extreme ultraviolet light can be created only from plasmas. Scientists at the University of Washington College of Engineering have developed a "low-cost version of a fusion reactor," dubbed ZaP, that should provide the light output that the microprocessor industry needs.
 
Read the full story here


return to the latest published articles